离子束溅射MoS2二硫化钼涂层加工

· Coating deposition carried out using a high density of low energy bombarding ions.

使用高密度低能量轰击离子进行沉积镀膜。

· Deposition of very dense, non-columnar coating structures with low internal stresses.

镀层致密度好，低柱状晶结构，内应力低

· Deposition of coatings with dense structures at low temperatures.

• 可在低温环境下沉积致密结构的镀层

· High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.

高效率等离子清理以提供高的镀层结合强度。

· Coatings quality is assured by the use of specially designed Plasmag sputter sources, which create an intense plasma and high ion bombardment of work pieces.

镀层品质保证是由使用专门设计plasmag溅射源及提供高密度的等离子。